Posted: April 27th, 2016

digital and integrated electronic design

The design work involves producing layouts for circuit in Fig. 1. Such layouts correspond to the patterns developed on the masks, for use in the fabrication process, as discussed in lectures. Each of the layouts MUST be drawn on a graph paper with stipulated scale (e.g. 1µm per cm). The four masks that need to be defined are: device area, gate stripe, contacts and metal pattern. Produce individual layouts for each device i.e. A, B, C and D, and also the overall layout for the circuit, in terms of the minimum feature size. Make sure to include the alignment errors between the layouts and minimise the area used.